In the production process of the semiconductor industry, water is an essential raw material and process auxiliary. However, there are some substances in the water that are harmful to semiconductor production equipment and products, such as organic matter and chlorine. These substances will pollute production equipment, reduce work efficiency, and even cause production interruptions and product quality degradation. Therefore, in order to ensure the stability and efficiency of production equipment and products, the semiconductor industry uses activated carbon filters to purify water and remove organic matter and chlorine.
Why does semiconductor industry need high-quality water?
Among the water quality used in the semiconductor industry, resistivity, microparticles, bubbles (dissolved oxygen, dissolved nitrogen) and TOC are very important indicators. Slight differences may lead to a decline in product quality and qualified rate in the production process of semiconductor components. The specific impacts are as follows:
TOC (total organic carbon): affects photolithography accuracy and chip quality.
DO (dissolved oxygen): breeds bacteria, forms an oxide layer, and affects chip quality.
Boron (boron element): affects P-N junction and chip quality.
Silica (silicon element): causes water spots on wafers and affects chip quality.
Metal ions: affect wafer atomic density and chip quality.
Microparticles: affect photolithography accuracy, and conductive microparticles will directly cause short circuits.
Ultrapure water application in the semiconductor industry
In semiconductor production, ultrapure water can be used for wafer washing, chemical dilution, chemical mechanical polishing, humidification source in clean room environment, etc. The quality of ultrapure water is directly related to the yield rate of semiconductors. As the size of semiconductor components decreases and their sophistication increases, the technical requirements for ultrapure water quality are also increasing.
Wafer preparation:
Ultrapure water is used to clean, remove particles and chemical impurities, ensure the cleanliness of the wafer surface, and thus reduce manufacturing defects.
Photolithography:
In the semiconductor photolithography process, ultrapure water is used to clean masks, lenses, and wafers to ensure accurate pattern repetition and photolithography quality.
Etching and corrosion:
Ultrapure water is used for cooling and cleaning in semiconductor etching and corrosion processes to maintain process accuracy and consistency.
Chemical mechanical polishing (CMP):
Ultrapure water is used to cool, clean, and transport wafers during CMP to ensure surface flatness and quality during CMP.
Electrochemical deposition (ECD):
Ultrapure water is used to clean metal films, electrolytes, and other materials to ensure accuracy and consistency of the electrochemical deposition process.
Equipment cooling and cooling towers:
Ultrapure water is also used to cool semiconductor equipment to keep the equipment running at a suitable operating temperature.
How to purify water with activated carbon in semiconductor industry?
Activated carbon plays several specific roles in semiconductor water treatment. Here’s a concise overview of its key applications:
Organic Contaminant Removal:
Adsorbing organic compounds that can interfere with semiconductor manufacturing processes.
Dechlorination:
Effectively removing chlorine and chloramines from water, which can damage sensitive equipment.
TOC Reduction:
Significantly lowers Total Organic Carbon levels, crucial for maintaining ultra-pure water standards.
Particle Filtration:
Some activated carbon types act as mechanical filters, trapping fine particles.
Protection of RO Membranes:
Removing compounds that could foul or damage reverse osmosis membranes.
Trace Contaminant Elimination:
Capturing trace amounts of various impurities that could affect semiconductor quality.
Pretreatment:
Serving as an initial purification step, enhancing the efficiency of subsequent treatments.
Dissolved Gas Reduction:
Helps remove dissolved gases like carbon dioxide, which can affect water purity.
Conclusion
The semiconductor industry’s reliance on ultra-pure water underscores the critical role of advanced water treatment technologies. Activated carbon stands out as an indispensable component in this process, offering unparalleled efficiency in removing organic compounds, chlorine, and other impurities that could compromise the integrity of semiconductor production. Its versatility in addressing multiple contaminants, coupled with its cost-effectiveness and sustainability, makes it an ideal solution for the industry’s stringent water quality requirements.
Zhulin Carbon specializes in high-performance activated carbon solutions designed to meet the exacting standards of the semiconductor industry. Our advanced activated carbon products are engineered to deliver superior water purification, effectively removing organic compounds, chlorine, and other contaminants that can compromise semiconductor manufacturing.
Now explore Zhulin Carbon’s range of activated carbon products designed specifically for semiconductor water treatment.